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Vacuum unit model VU-1A

Intended for overcoating on optical details the method of capacitance-resistance and cathode-ray evaporation of dielectrics, semiconductor materials and metals with simultaneous control of thickness of coverage.

Technical characteristics

Working vacuum, Pa 4х10-4
Working chamber dimensions (Ø х Н), mm 700х700
The time to reach a working vacuum chamber when heated to 320 °C, min 40
The number of electron-beam evaporators, pcs 1
The number of resistive evaporators, pcs 2
Installed power, kW 20
The area occupied by the installation, m2 6
Weight, kg 2600

Vacuum unit model VU-2M

Intended for coating optical components by method resistive and electron-beam evaporation dielectrics, semiconductor materials and metals with simultaneous control of coating thickness.

The installation provided: pumping chamber, ionic cleaning and heating the components in an automatic mode; application of coatings in manual mode.

Technical characteristics

Working vacuum, Pa 6х10-4
Working chamber dimensions (Ø х Н), mm 700х770
The time to reach a working vacuum without preheating chamber volume, min 30
The number of electron-beam evaporators, pcs 2
The number of resistive evaporators, pcs 1
Installed power, kW 30
The area occupied by the installation, m2 6
Weight, kg 1970

Vacuum unit model VU-800

Standardized gamma vacuum systems for applying vacuum coatings on optical components by resistive and electron-beam evaporation of dielectrics, semiconductors and metals with simultaneous photometric and quartz control coating thickness in automatic regime of pumping and process of precipitation.

Stabilization of process of coating and its management is carried out on the basis of built-in microcomputer with a color graphic display.

Technical characteristics

  VU-800M VU-800V VU-800I VU-800U
Working vacuum, Pa 5х10-4 5х10-4 5х10-4 5х10-4
The time to reach a working vacuum, min 30 30 30 30
The number of electron-beam evaporators, pcs - 2 2 2
The number of resistive evaporators, pcs 2 2 2 2
Range of photometric control, µm 0,4÷0,8 0,25÷1,1 0,8÷2,6 0,25÷2,6
Installed power, kW, no more 28 40 40 40
The area occupied by the installation, m2, no more 7,7 7,7 7,7 7,7
Weight, kg, no more 2770 3000 3000 3180

Vacuum unit model VU-3

Intended for deposition of in a variety of vacuum coating - metal, antireflection, interference, mirrored and other - on optical components for different regions of the spectrum by means of thermal and electron beam evaporation of different materials while controlling the optical thickness of the coating.

The configuration of computer of control system - Pentium.

Perspective is the use of the installation in the manufacture of microelectronics manufacturing technology for applying conductive, resistive and dielectric thin films with the specified parameters.

Technical characteristics

Internal dimensions of working chamber, mm
- base Ø 800
- height 950
Diameter of workpiece, mm to 500
For spraying the material used
- two electron-beam evaporator 12 kW
- two thermal evaporator 4 kW
Provided for:
- ion-cleaning of machined parts
- replacement of cathode-ray and (or) thermal evaporator system (s) of ion-plasma spraying

The installation provides a precision adjustment of optical components in a heating temperature range of 300 to 600 °C

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